Mark H. Somervell
Mark H. Somervell publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry, on topics such as Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques and Block Copolymer Self-Assembly.
- World rank
- #5,548,345 of 7,710,434 ranked researchers
- Rank in Japan
- #190,700 of 383,136
- Works
- 54
- Citations
- 899
- Citations per work
- 16.6
What does Mark H. Somervell research?
Mark H. Somervell's work is mostly in Engineering (68%), Materials Science (16%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4583.7%
- Engineering3768.0%
- Materials Science815.7%
- Everything else916.3%
- 1Electrical and Electronic Engineering41% of their works
- 2Biomedical Engineering19% of their works
- 3Materials Chemistry9% of their works
- 4Surfaces, Coatings and Films6% of their works
- 5Mechanical Engineering4% of their works
- 6Industrial and Manufacturing Engineering4% of their works
Research topics
- Advancements in Photolithography Techniques
- Nanofabrication and Lithography Techniques
- Block Copolymer Self-Assembly
- Electron and X-Ray Spectroscopy Techniques
- Semiconductor materials and devices
- Electronic Packaging and Soldering Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Polymer Synthesis and Characterization
Which keywords describe Mark H. Somervell's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Nanolithography, Soft Lithography, Block Copolymers, Self-Assembly and Lithography.
- Click Chemistry
- Interfacial Reactions
- High-k Dielectrics
- Atomic Layer Deposition
- Scanning Electron Microscopy
- Lithography
- Block Copolymers
- Nanolithography
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Soft Lithography
- Self-Assembly
- Nanotechnology
- X-ray Photoelectron Spectroscopy
- Failure Analysis
- Integrated Circuits
- Lead-free Solders
- Living Radical Polymerization
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 19 words, with their numbers
- High-Resolution Patterning622 topics
- Electron Beam Lithography381 topic
- Nanofabrication381 topic
- Nanolithography241 topic
- Soft Lithography241 topic
- Block Copolymers182 topics
- Self-Assembly182 topics
- Lithography151 topic
- Nanotechnology151 topic
- Scanning Electron Microscopy71 topic
- X-ray Photoelectron Spectroscopy71 topic
- Atomic Layer Deposition61 topic
- Failure Analysis61 topic
- High-k Dielectrics61 topic
- Integrated Circuits61 topic
- Interfacial Reactions61 topic
- Lead-free Solders61 topic
- Click Chemistry31 topic
- Living Radical Polymerization31 topic
Where does Mark H. Somervell work?
Mark H. Somervell's main affiliation in the publication record is Tokyo Electron (Japan), Japan.
How many publications and citations does Mark H. Somervell have?
OpenAlex counts 54 works and 899 citations for Mark H. Somervell, an h-index of 20, ranking #5,548,345 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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