Mark T. Bohr
Mark T. Bohr publishes mostly in Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Biomedical Engineering, on topics such as Semiconductor materials and devices, Advancements in Semiconductor Devices and Circuit Design and Low-power high-performance VLSI design.
- World rank
- #85,059 of 7,710,434 ranked researchers
- Rank in United States
- #32,849 of 1,627,098
- Works
- 70
- Citations
- 7.5k
- Citations per work
- 107.3
What does Mark T. Bohr research?
Mark T. Bohr's work is mostly in Engineering (90%), Materials Science (4%), Computer Science (2%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences6997.9%
- Engineering6390.4%
- Materials Science23.5%
- Computer Science12.0%
- Physics and Astronomy12.0%
- Everything else12.1%
- 1Electrical and Electronic Engineering86% of their works
- 2Electronic, Optical and Magnetic Materials4% of their works
- 3Biomedical Engineering3% of their works
- 4Hardware and Architecture2% of their works
- 5Atomic and Molecular Physics, and Optics2% of their works
- 6Industrial and Manufacturing Engineering1% of their works
Research topics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Low-power high-performance VLSI design
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Copper Interconnects and Reliability
- Nanowire Synthesis and Applications
- Ferroelectric and Negative Capacitance Devices
Which keywords describe Mark T. Bohr's research?
The keywords of their largest research topics: Process Variation, Atomic Layer Deposition, High-k Dielectrics, Nanowire Transistors, Tunnel Field-Effect Transistors, Low-Power, VLSI Circuits and Failure Analysis.
- Nanowire
- Hafnium Oxide
- Microelectronics
- Through-Silicon Via
- Thin Films
- Failure Analysis
- Low-Power
- Nanowire Transistors
- Atomic Layer Deposition
- Process Variation
- High-k Dielectrics
- Tunnel Field-Effect Transistors
- VLSI Circuits
- Integrated Circuits
- Interconnect
- Low-k Dielectrics
- Ferroelectricity
- Nanosensors
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 18 words, with their numbers
- Process Variation712 topics
- Atomic Layer Deposition551 topic
- High-k Dielectrics551 topic
- Nanowire Transistors481 topic
- Tunnel Field-Effect Transistors481 topic
- Low-Power231 topic
- VLSI Circuits231 topic
- Failure Analysis121 topic
- Integrated Circuits121 topic
- Thin Films122 topics
- Interconnect91 topic
- Through-Silicon Via91 topic
- Low-k Dielectrics71 topic
- Microelectronics71 topic
- Ferroelectricity51 topic
- Hafnium Oxide51 topic
- Nanosensors51 topic
- Nanowire51 topic
Where does Mark T. Bohr work?
Mark T. Bohr's main affiliation in the publication record is Intel (United States), United States.
How many publications and citations does Mark T. Bohr have?
OpenAlex counts 70 works and 7,508 citations for Mark T. Bohr, an h-index of 38, ranking #85,059 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
Ask a question or share a note about Mark T. Bohr. Posts are plain text and can be reported.