Shumay D. Shang
Shumay D. Shang publishes mostly in Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Surfaces, Coatings and Films, on topics such as Advancements in Photolithography Techniques, Industrial Vision Systems and Defect Detection and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #7,457,116 of 7,710,434 ranked researchers
- Rank in United States
- #1,610,150 of 1,627,098
- Works
- 34
- Citations
- 134
- Citations per work
- 3.9
What does Shumay D. Shang research?
Shumay D. Shang's work is mostly in Engineering (74%), Materials Science (9%), Computer Science (5%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3088.7%
- Engineering2574.2%
- Materials Science39.3%
- Computer Science25.2%
- Everything else411.3%
- 1Electrical and Electronic Engineering44% of their works
- 2Industrial and Manufacturing Engineering19% of their works
- 3Surfaces, Coatings and Films9% of their works
- 4Biomedical Engineering8% of their works
- 5Hardware and Architecture5% of their works
- 6Control and Systems Engineering3% of their works
Research topics
- Advancements in Photolithography Techniques
- Industrial Vision Systems and Defect Detection
- Integrated Circuits and Semiconductor Failure Analysis
- Electron and X-Ray Spectroscopy Techniques
- VLSI and Analog Circuit Testing
- Advanced Surface Polishing Techniques
- Manufacturing Process and Optimization
- VLSI and FPGA Design Techniques
Which keywords describe Shumay D. Shang's research?
The keywords of their largest research topics: Electron Beam Lithography, Nanofabrication, Fabric Defect Detection, Machine Vision, Failure Analysis, Integrated Circuits, Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy.
- FPGA
- Test Data Compression
- Embedded Cores
- Chemical Mechanical Planarization
- X-ray Photoelectron Spectroscopy
- Integrated Circuits
- Machine Vision
- Nanofabrication
- Electron Beam Lithography
- Fabric Defect Detection
- Failure Analysis
- Scanning Electron Microscopy
- Assembly Planning
- Design for Manufacture
- Material Removal Mechanism
- ASIC
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most.
All 16 words, with their numbers
- Electron Beam Lithography261 topic
- Nanofabrication261 topic
- Fabric Defect Detection111 topic
- Machine Vision111 topic
- Failure Analysis101 topic
- Integrated Circuits101 topic
- Scanning Electron Microscopy91 topic
- X-ray Photoelectron Spectroscopy91 topic
- Assembly Planning51 topic
- Chemical Mechanical Planarization51 topic
- Design for Manufacture51 topic
- Embedded Cores51 topic
- Material Removal Mechanism51 topic
- Test Data Compression51 topic
- ASIC31 topic
- FPGA31 topic
Where does Shumay D. Shang work?
Shumay D. Shang's main affiliation in the publication record is Mentor Technologies, United States.
How many publications and citations does Shumay D. Shang have?
OpenAlex counts 34 works and 134 citations for Shumay D. Shang, an h-index of 8, ranking #7,457,116 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
Ask a question or share a note about Shumay D. Shang. Posts are plain text and can be reported.