Tongde Li
Tongde Li publishes mostly in Electrical and Electronic Engineering, Hardware and Architecture and Complementary and alternative medicine, on topics such as Radiation Effects in Electronics, Semiconductor materials and devices and Advancements in Semiconductor Devices and Circuit Design.
- World rank
- #5,932,699 of 7,710,434 ranked researchers
- Rank in China
- #842,808 of 978,568
- Works
- 50
- Citations
- 454
- Citations per work
- 9.1
What does Tongde Li research?
Tongde Li's work is mostly in Engineering (72%), Computer Science (7%), Medicine (4%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences4181.2%
- Engineering3672.2%
- Computer Science36.9%
- Chemistry12.1%
- Everything else713.2%
- Health Sciences24.2%
- Medicine24.2%
- Life Sciences11.4%
- 1Electrical and Electronic Engineering72% of their works
- 2Hardware and Architecture7% of their works
- 3Complementary and alternative medicine3% of their works
- 4Organic Chemistry2% of their works
- 5Physiology1% of their works
- 6Pharmacology1% of their works
Research topics
- Radiation Effects in Electronics
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- VLSI and Analog Circuit Testing
- Silicon Carbide Semiconductor Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Low-power high-performance VLSI design
- Electrostatic Discharge in Electronics
Which keywords describe Tongde Li's research?
The keywords of their largest research topics: Nanoelectronics, CMOS Technology, Radiation Effects, Soft Errors, Atomic Layer Deposition, High-k Dielectrics, Process Variation and Nanowire Transistors.
- ESD Protection
- Low-Power
- Reliability
- Failure Analysis
- Embedded Cores
- Nanowire Transistors
- High-k Dielectrics
- Soft Errors
- CMOS Technology
- Nanoelectronics
- Radiation Effects
- Atomic Layer Deposition
- Process Variation
- Tunnel Field-Effect Transistors
- Test Data Compression
- Integrated Circuits
- Wide Bandgap Semiconductors
- VLSI Circuits
- SCR Devices
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 19 words, with their numbers
- Nanoelectronics592 topics
- CMOS Technology443 topics
- Radiation Effects331 topic
- Soft Errors331 topic
- Atomic Layer Deposition261 topic
- High-k Dielectrics261 topic
- Process Variation232 topics
- Nanowire Transistors161 topic
- Tunnel Field-Effect Transistors161 topic
- Embedded Cores91 topic
- Test Data Compression91 topic
- Failure Analysis81 topic
- Integrated Circuits81 topic
- Reliability81 topic
- Wide Bandgap Semiconductors81 topic
- Low-Power71 topic
- VLSI Circuits71 topic
- ESD Protection41 topic
- SCR Devices41 topic
Where does Tongde Li work?
Tongde Li's main affiliation in the publication record is Beijing Microelectronics Technology Institute, China.
How many publications and citations does Tongde Li have?
OpenAlex counts 50 works and 454 citations for Tongde Li, an h-index of 10, ranking #5,932,699 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
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