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Researcher · United Microelectronics (Taiwan) · Taiwan

Yung Feng Cheng

Yung Feng Cheng publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Industrial and Manufacturing Engineering, on topics such as Advancements in Photolithography Techniques, Industrial Vision Systems and Defect Detection and Advanced Surface Polishing Techniques.

OpenAlex
World rank
#6,844,639
of 7,710,434 ranked researchers
Rank in Taiwan
#52,200
of 57,035
Works
16
Citations
14
Citations per work
0.9
h-index
2
i10-index 0Top 99.1% in Electrical and Electronic Engineering
Yung Feng Cheng

What does Yung Feng Cheng research?

Yung Feng Cheng's work is mostly in Engineering (92%), Materials Science (8%).

Physical Sciences: 16 works · 100.0% of their workEngineering: 15 works · 91.5% of their workElectrical and Electronic Engineering: 9 works · 55.3% of their workBiomedical Engineering: 2 works · 14.9% of their workIndustrial and Manufacturing Engineering: 2 works · 14.9% of their workMechanical Engineering: 1 works · 4.3% of their workComputational Mechanics: 0 works · 2.1% of their workMaterials Science: 1 works · 8.5% of their workSurfaces, Coatings and Films: 1 works · 8.5% of their workTHEIR WORKYung Feng Cheng16works
Physical Sciences100%

Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.

The fields and subfields, with their numbers
    1. Engineering1591.5%
    2. Materials Science18.5%
  1. 1Electrical and Electronic Engineering55% of their works
  2. 2Biomedical Engineering15% of their works
  3. 3Industrial and Manufacturing Engineering15% of their works
  4. 4Surfaces, Coatings and Films8% of their works
  5. 5Mechanical Engineering4% of their works
  6. 6Computational Mechanics2% of their works

Research topics

Which keywords describe Yung Feng Cheng's research?

The keywords of their largest research topics: Nanofabrication, High-Resolution Patterning, Electron Beam Lithography, Resolution Limits, Fabric Defect Detection, Machine Vision, Chemical Mechanical Planarization and Interconnect.

Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.

All 18 words, with their numbers
  1. Nanofabrication182 topics
  2. High-Resolution Patterning172 topics
  3. Electron Beam Lithography161 topic
  4. Resolution Limits161 topic
  5. Fabric Defect Detection71 topic
  6. Machine Vision71 topic
  7. Chemical Mechanical Planarization61 topic
  8. Interconnect61 topic
  9. Material Removal Mechanism61 topic
  10. Through-Silicon Via61 topic
  11. Failure Analysis31 topic
  12. Integrated Circuits31 topic
  13. Antireflective Coatings21 topic
  14. Nanostructures21 topic
  15. Scanning Electron Microscopy21 topic
  16. X-ray Photoelectron Spectroscopy21 topic
  17. Nanolithography11 topic
  18. Soft Lithography11 topic

Where does Yung Feng Cheng work?

Yung Feng Cheng's main affiliation in the publication record is United Microelectronics (Taiwan), Taiwan.

How many publications and citations does Yung Feng Cheng have?

OpenAlex counts 16 works and 14 citations for Yung Feng Cheng, an h-index of 2, ranking #6,844,639 of 7,710,434 researchers worldwide on the quality score.

Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.

Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.

Discussion

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