Tomoyuki Ando
Tomoyuki Ando publishes mostly in Electrical and Electronic Engineering, Biomedical Engineering and Molecular Biology, on topics such as Advancements in Photolithography Techniques, Nanofabrication and Lithography Techniques and Integrated Circuits and Semiconductor Failure Analysis.
- World rank
- #3,477,915 of 7,710,434 ranked researchers
- Rank in Japan
- #84,943 of 383,136
- Works
- 46
- Citations
- 1.7k
- Citations per work
- 36.9
What does Tomoyuki Ando research?
Tomoyuki Ando's work is mostly in Engineering (62%), Materials Science (11%), Biochemistry, Genetics and Molecular Biology (6%).
Their six largest subfields, inside their fields and domains; the grey slice is everything else they publish. The interactive view splits every one of their works down to single topics.
The fields and subfields, with their numbers
- Physical Sciences3473.2%
- Engineering2861.8%
- Materials Science511.4%
- Everything else716.1%
- Life Sciences36.1%
- Health Sciences24.6%
- Medicine24.6%
- 1Electrical and Electronic Engineering39% of their works
- 2Biomedical Engineering23% of their works
- 3Molecular Biology6% of their works
- 4Surfaces, Coatings and Films6% of their works
- 5Electronic, Optical and Magnetic Materials5% of their works
- 6Pulmonary and Respiratory Medicine5% of their works
Research topics
- Advancements in Photolithography Techniques
- Nanofabrication and Lithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies
- Electronic Packaging and Soldering Technologies
- Copper Interconnects and Reliability
- Advanced Surface Polishing Techniques
- Electron and X-Ray Spectroscopy Techniques
Which keywords describe Tomoyuki Ando's research?
The keywords of their largest research topics: High-Resolution Patterning, Electron Beam Lithography, Nanofabrication, Nanolithography, Soft Lithography, Electromigration, Failure Analysis and Integrated Circuits.
- X-ray Photoelectron Spectroscopy
- Material Removal Mechanism
- Microelectronics
- Lead-free Solders
- Through-Silicon Via
- Integrated Circuits
- Electromigration
- Nanolithography
- Electron Beam Lithography
- High-Resolution Patterning
- Nanofabrication
- Soft Lithography
- Failure Analysis
- Interconnect
- Interfacial Reactions
- Low-k Dielectrics
- Chemical Mechanical Planarization
- Scanning Electron Microscopy
Size is their works in the topics tagged with each word, from their 8 largest topics. Each links to the topic it comes from most. The words come from the keyword list OpenAlex gives each topic, not from the text of the papers, so a word can appear that none of the papers uses.
All 18 words, with their numbers
- High-Resolution Patterning412 topics
- Electron Beam Lithography221 topic
- Nanofabrication221 topic
- Nanolithography191 topic
- Soft Lithography191 topic
- Electromigration142 topics
- Failure Analysis91 topic
- Integrated Circuits91 topic
- Interconnect91 topic
- Through-Silicon Via91 topic
- Interfacial Reactions71 topic
- Lead-free Solders71 topic
- Low-k Dielectrics71 topic
- Microelectronics71 topic
- Chemical Mechanical Planarization61 topic
- Material Removal Mechanism61 topic
- Scanning Electron Microscopy51 topic
- X-ray Photoelectron Spectroscopy51 topic
Where does Tomoyuki Ando work?
Tomoyuki Ando's main affiliation in the publication record is Tokyo Ohka Kogyo (Japan), Japan.
How many publications and citations does Tomoyuki Ando have?
OpenAlex counts 46 works and 1,699 citations for Tomoyuki Ando, an h-index of 13, ranking #3,477,915 of 7,710,434 researchers worldwide on the quality score.
Ranked on field-normalised citation excellence (50%), output (30%) and citations (20%). Counts come from OpenAlex author records, which occasionally merge different people who share a name or split one person into several.
Papers, co-authors, who cited this work and researchers on the nearest topics have tabs of their own, above. Is this your page? Claim it with your ORCID iD, or request a correction or removal.
Discussion
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